ASML (Veldhoven, Netherlands)
ASML is an innovation leader in the semiconductor industry. We provide chipmakers with everything they need – hardware, software and services – to mass produce patterns on silicon through lithography.
Do you want to contribute and participate in the design of most advanced ASML scanners? You have a passion for physics understanding of our systems and diffraction based imaging? Are you fascinated by lithography?
Then EUV Imaging performance is where you need to be!
As an EUV Imaging Performance Design Engineer you contribute to the development of ASML products by testing, analyzing, qualifying, troubleshooting – and understanding our systems. We are responsible for the imaging performance of the system as a whole.
You will be a key player in making the performance of our scanners meet our customer’s needs and will be working with our EUV flagships both on low NA (install base and NXE3800) and our brand newly introduced imaging records breaking high NA EXE5000 tools.
Role and ResponsibilitiesAs EUV Imaging Performance Design Engineer you will be responsible for:
You will be working in the imaging team which is placed in the EUV system performance agile release train. The team has members with diverse backgrounds, experience levels and character. We want to enable you to be a great engineer and will – together with your drive an engagement – take care that you can grow far!
Education and experienceFor this role you need a solid technical background, MSc/PhD in e.g. Optical Engineering, applied Physics, Physics. Also, you need the following experience:
Working at the cutting edge of tech, you’ll always have new challenges and new problems to solve – and working together is the only way do that. You won’t work in a silo. Instead, you’ll be part of a creative, dynamic work environment where you’ll collaborate with supportive colleagues. There is always space for creative and unique points of view. You’ll have the flexibility and trust to choose how best to tackle tasks and solve problems. To thrive in this job, you’ll need the following skills.
Within ASML the sector Development & Engineering is responsible for the specification and the design of the ASML products. The department System Performance is responsible for timely and cost-effective qualification of overlay, focus, imaging and productivity performance of functional modules, machines and customer applications. You will be working in a multidisciplinary project team, in a dynamic and high-tech environment.
Imaging competence will allow you to learn the basic principles of our lithographic system, to be in the heart of its development, understand contribution of various system components (aberrations, focus, dose, illumination, dynamics etc.) on the basic imaging functionality, collaborate with various functional clusters as well as our supporting competencies (resist, reticle, wafer metrology).
This position requires access to controlled technology, as defined in the United States Export Administration Regulations (15 C.F.R. § 730, et seq.). Qualified candidates must be legally authorized to access such controlled technology prior to beginning work. Business demands may require ASML to proceed with candidates who are immediately eligible to access controlled technology.
Diversity and inclusionASML is an Equal Opportunity Employer that values and respects the importance of a diverse and inclusive workforce. It is the policy of the company to recruit, hire, train and promote persons in all job titles without regard to race, color, religion, sex, age, national origin, veteran status, disability, sexual orientation, or gender identity. We recognize that Diversity and inclusion is a driving force in the success of our company.
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Work Experience: See job description
Travel: 10%
Education Level: Master,PhD
Employment Type: FULL_TIME
Team: Design Engineering and Architecture
Technical Field: Lithography System Performance